Product
Industrial Equipment
Inline Plasma CVD System
Inline Plasma CVD System
SLPC71H
Solar energy has recently attracted much attention as a new form of energy to replace the use of fossil fuels. The SLPC-71H is designed to carry out the deposition of antireflection coating films on solar cells, which are key components of solar energy generation systems. We utilized our wide range of experience with parallel-plate, vertical and two-side electrode plasma CVD systems to develop this premier system for the deposition of antireflection coatings, with many unique features to optimize production.
Features
Face Up Deposition contributes to
- Full Deposition Coverage over Substrates
- Easy Loading/Unloading Substrates
- Handling Thin Substrates
Low Frequency Power and Direct Plasma are effective for Passivation Deposition on a surface
High Temperature Deposition enables Bulk Passivation Formation into certain depth of substrates
Typical Specifications
| Type of film deposited: | SiNx | |
|---|---|---|
| Effective deposition area: | 930mm x 1,276mm | |
| Number of settable substrate: (per cart) | 156mm sq. substrates: 48 substrates | |
| Tact time: | 3.1 minutes per cart (in case of heating substrates to 450°C ) |
|
| Deposition temperature: | Over 450°C | |
Inquiry for further information will be highly appreciated.
Please contact lcd-semi@group.shimadzu.co.jp