Diffraction Gratings
- Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm).Suitable for the next-generation semiconductor lithography.
- Less High-Order Light due to Laminar type grooves configuration, Low stray light by Holographic manufacturing technology, andHigh-resolution from aspherical waves exposure method to correct Astigmatism aberration.
- Enable to easily produce spectrometers by combining with an array-type detector.
- Suitable for monitoring EUV lights as well as for Emission Spectroscopy
RoHS* compliant products.
*RoHS:Directive 2002/95/EC on the Restriction of the Use of certain Hazardous Substances in Electrical and Electronic
Equipment
Specifications
| Classification |
Unequally spaced curved-groove laminar-type replica grating *1 |
| Blank material |
BK-7 or equivalent |
| Dimension tolerance |
±0.2(W)×±0.2(H) |
| Center thickness tolerance |
±0.5(T) |
| Grooved area |
Total area less 2mm strip around the perimeter |
| Effective area |
Total area less 5mm strip around the perimeter
|
| Groove density tolerance |
±0.5% |
| Coating |
Gold(Au) |
| Scratches and digs |
80-50(in accordance with MIL-O-13830A) |
| Temperature |
0°C to 50°C |
*1:The grating grooves are formed with resign.
*Be sure to prevent condensation. Otherwise, it causes significant deterioration of optical Characteristics