Product

Optical Devices

Diffraction Gratings

Laminar type Replica Diffraction Grating for Soft X-ray Region

Laminar type Replica Diffraction Grating for Soft X-ray Region


  • Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm).Suitable for the next-generation semiconductor lithography.

  • Less High-Order Light due to Laminar type grooves configuration, Low stray light by Holographic manufacturing technology, andHigh-resolution from aspherical waves exposure method to correct Astigmatism aberration.

  • Enable to easily produce spectrometers by combining with an array-type detector.

  • Suitable for monitoring EUV lights as well as for Emission Spectroscopy

RoHS* compliant products.
*RoHS:Directive 2002/95/EC on the Restriction of the Use of certain Hazardous Substances in Electrical and Electronic
Equipment

Mounting/Dimensions

Specifications

Classification Unequally spaced curved-groove laminar-type replica grating *1
Blank material BK-7 or equivalent
Dimension tolerance ±0.2(W)×±0.2(H)
Center thickness tolerance ±0.5(T)
Grooved area Total area less 2mm strip around the perimeter
Effective area Total area less 5mm strip around the perimeter
Groove density tolerance ±0.5%
Coating Gold(Au)
Scratches and digs 80-50(in accordance with MIL-O-13830A)
Temperature 0°C to 50°C

*1:The grating grooves are formed with resign.
*Be sure to prevent condensation. Otherwise, it causes significant deterioration of optical Characteristics