Product

Process 1: Forming transparent conducting films (Texturing to enhance light trapping effect)

Evaluation method / Instrument required:

• Fluorine measurements in TCO / EPMA
• Reflectance and transmission measurements on substrates (with conducting film) / SolidSpec
• Texture bump observation / SPM

Process 2: p1 patterning

Process 3: Forming a-Si light-absorbing layers (p, i, n layers)

Evaluation method / Instrument required:

• Reflectance and transmission measurements of a-Si/ microcrystalline Si film /SolidSpec
• Si-H bonding analysis on a-Si/microcrystalline Si film / FTIR
• Orientation measurement of microcrystalline Si film / XRD

Process 4: Forming microcrystalline Si light-absorbing layers (p, i, n layers)

Evaluation method / Instrument required:

• Reflectance and transmission measurements of a-Si/ microcrystalline Si film / SolidSpec
• Si-H bonding analysis on a-Si/microcrystalline Si film / FTIR
• Orientation measurement of microcrystalline Si film / XRD

Process 5: P2 patterning

Process 6: Forming back electrode

Evaluation method / Instrument required:

• Electrode thickness measurements / µEDX

Process 7: p3 patterning

• Cell reflectance/transmission measurements / SolidSpec

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