Analysis of SiO2 Thin Film on Si Wafer

In this Application News SiO2 thin films between one and several nanometers thick formed on silicon wafers are were analyzed with the Shimadzu IRPrestige-21, using the transmission and ATR (single-reflection, GE prism) methods.

Content Type:
Application
Document Number:
LAAN-A-FT-E005
Product Type:
Molecular Spectroscopy, FTIR Spectroscopy
Keywords:
ATR Molecular, Spectroscopy, Electronics, Electronic, Semi-conductor, Electronic parts, Mounting board, Printed Circuit Board, IRPrestige-21
Language:
English
File Name:
a362.pdf
File Size:
59kb

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