Management of the components in the plating solution is very important from the standpoint of maintaining the quality of the plating. Aside from the main components in the plating solution, management of the trace components and additives, typically present at different concentrations, is also important. Efficient analysis of these metallic components requires an analytical instrument capable of both high-sensitivity measurement and measurement over a wide concentration range. ICP atomic emission spectrometry is a method of analysis that is suitable for such analyses due to its wide dynamic range, permitting analysis over a wide range of concentrations, from μg/L to the percentage level. We performed simultaneous elemental analysis of the zinc plating solution, from the principle to trace level elements, using the Shimadzu ICPE-9820 multi-type ICP atomic emission spectrometer.