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Elements
Drift %
Std. at 2.0J
Repeatability 1.0J,
n=6, RSD%, Day 1
Repeatability 1.0J,
n=6, RSD% Day2
0.5J
spike recovery
1.5J
spike recovery
Detectability
0.8J/1.0J
Cd -2.8% 1.48 1.34 105% 97% 79%
Pb -1.0% 0.21 1.36 111% 96% 79%
As -2.6% 1.47 0.49 97% 99% 79%
Hg -2.3% 0.48 1.18 98% 95% 79%
Co -3.7% 1.03 0.44 100% 97% 80%
V -2.5% 1.03 0.71 99% 97% 79%
Ni -3.0% 0.92 0.59 98% 97% 80%
Tl -1.0% 0.63 1.17 95% 94% 79%
Au -1.9% 0.47 1.99 114% 111% 61%
Pd -3.8% 1.73 0.78 98% 79% 84%
Ir -2.5% 0.37 1.77 99% 96% 79%
Os -2.6% 0.32 1.57 88% 81% 80%
Rh -2.9% 1.46 0.95 98% 111% 78%
Ru -3.6% 1.58 1.14 99% 97% 80%
Pt -2.0% 0.55 1.78 96% 83% 79%
Se -2.0% 1.04 1.49 103% 102% 80%
Ag 0.6% 1.49 0.22 105% 100% 87%
Li -3.8% 2.37 1.50 105% 91% 78%
Sb -0.8% 0.78 0.78 101% 101% 79%
Ba -2.8% 1.18 0.82 97% 115% 79%
Mo -4.0% 1.15 0.72 99% 99% 79%
Cu -4.2% 1.28 0.26 98% 103% 83%
Sn -2.5% 0.77 0.92 101% 101% 79%
Cr -3.6% 0.98 0.45 100% 99% 79%
Table 5. Method validation results according to USP<233>.
• Specificity : Mass peak profiles were examined to ensure that each target element is free of interference from other
elements and matrix components. Peak profile of As, Cd and Hg of the blank matrix used for sample preparation and
calibration standards are shown in Figure 3.
Figure 3. Mass peaks profiles of As75, Cd111 and Hg202
of calibration standards and blank matrix.
4. Conclusions
Targeted elemental impurities in three drug products were
analysed following new USP <232>/<233> using ICPMS-2030.
The method was validated following the procedures defined by
USP<233> and combined with microwave digestion for sample
preparation. Excellent calibration linearity, repeatability and low
drift were achieved for all 24 elements. Low LODs and LOQs
were achieved as compared to the J values for all 24 elements.
The simple method that using only He collision mode can
reduce the time to shift between different mode and thus
improve the throughput for routine trace elemental impurity
analysis in pharmaceutical product.
References:
[1] USP General Chapter <232> Elemental Impurities –
Limits, USP 40- NF 35, 2017
[2] USP General Chapter <233> Elemental Impurities –
Procedures, USP 38- NF 33, 2015
[3] Wang T.; Wu J.; Hartman R.; Jia X.; Egan RS, A multi-
element ICP-MS survey method as an alternative to the
heavy metals limit test for pharmaceutical materials. J.
Pharm. Biomed. Anal. 2000, 23(5), 867-890.
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