Diffraction GratingsLaminar-type Replica Diffraction Gratings for Soft X-ray Region

Laminar-type Replica Diffraction Gratings for Soft X-ray Region
  • Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm). Suitable for the next generation of semiconductor lithography.
  • Less high order light due to laminar type grooves configuration, Low stray light by holographic manufacturing technology, and high resolution from aspherical waves exposure method .
  • Easy to design spectrometers with array-type detectors.
  • Suitable for monitoring EUV lights as well as for Emission Spectroscopy
  • RoHS* compliant products.
  • *RoHS:Directive 2002/95/EC on the Restriction of the Use of certain Hazardous Substances in Electrical and Electronic Equipment

 

Mounting / Dimensions

 

Standard Specifications

Grating Type Unequally spaced curved-groove laminar-type replica grating *1
Blank material BK-7 or equivalent
Dimension tolerance ±0.2(W)×±0.2(H)
Center thickness tolerance ±0.5(T)
Grooved area Total area less 2mm strip around the perimeter
Effective area Total area less 5mm strip around the perimeter
Groove density tolerance ±0.5%
Scratches and digs 80-50 (in accordance with MIL-O-13830A)
  • *1:The grating grooves are formed with resin.
    *Be sure to prevent condensation. Otherwise, it causes significant deterioration of optical Characteristics