- Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm). Suitable for the next generation of semiconductor lithography.
- Less high order light due to laminar type grooves configuration, Low stray light by holographic manufacturing technology, and high resolution from aspherical waves exposure method .
- Easy to design spectrometers with array-type detectors.
- Suitable for monitoring EUV lights as well as for Emission Spectroscopy
|Grating Type||Unequally spaced curved-groove laminar-type replica grating *1|
|Blank material||BK-7 or equivalent|
|Center thickness tolerance||±0.5(Ｔ)|
|Grooved area||Total area less 2mm strip around the perimeter|
|Effective area||Total area less 5mm strip around the perimeter|
|Groove density tolerance||±0.5%|
|Scratches and digs||80-50 (in accordance with MIL-O-13830A)|