Online TOC Measurement for Ultra-pure Water in Semiconductor Industries

User Benefits

- Enables stable measurement of ultra-pure water with TOC concentrations below 1 μg/L. - The large color touch panel and compact body make operation easy. - The Active-Path structure, which integrates the lamp and sample flow path, enables high oxidation performance.

Introduction

The semiconductor manufacturing process involves various stages such as wafer production, film formation, photolithography, etching, and resist stripping, each of which involves cleaning steps. Even minimal contamination on the semiconductor surface can impact product quality and yield, making it crucial to effectively remove dirt and impurities during cleaning. For this reason, the purity of the cleaning water used in these cleaning processes is extremely important. The recent trend towards ever-smaller, higher-capacity semiconductors means that ultra-pure cleaning water, thoroughly free of organic and other impurities, has become essential.

November 28, 2025 GMT