Lithographic Exposure/Development

Lithographic exposure/development is a key process for forming fine-pitch circuit patterns on wafers. By combining advanced exposure and development technologies, it becomes possible to create fine-pitch circuit patterns on the wafer surface.
In recent years, alongside semiconductor miniaturization, EUV exposure technology has been adopted, and high-precision development control techniques have been introduced to meet the demands deriving from the use of EUV technology.
We introduce various analyses focusing on the analysis of the properties of organic substances and impurity analysis.